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Á÷°áÇü Oil Áø°øÆßÇÁ(G, GLD, GCD series) Diaphram Dry Vacuum Pump(DA series, DTC series)
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½ºÆÄÅ͸µ ÀåÄ¡(Sputtering System) |
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- Áø°øÁõÂøº¸´Ùµµ Á¤¹ÐÇÏ°í °íÁ¤µµÇÑ ¹Ú¸·À» ÀçÇö¼º ÁÁ°Ô Çü¼ºÇÏ°í, Áø°øÁõÂøÀ¸·Î´Â ºÒ°¡´ÉÇÑ °íÀ¶Á¡
¹°ÁúÀÇ ¼º¸·µµ °¡´ÉÇÑ puttering ÀåÄ¡ÀÔ´Ï´Ù.
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- ¿ëµµ¿¡ µû¶ó °íÁÖÆÄ Magnetron Sputter, °íÁÖÆÄ Sputter, ÀÌ¿Â Sputterµî ¼±ÅÃÇÒ ¼ö ÀÖ½À´Ï´Ù. |
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1) °íÁÖÆÄ ½ºÆÄÅ͸µ ÀåÄ¡(Compact radio frequency Sputtering System) |
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- CompactÇÑ ¼³°è |
- Àü¿øÀº 1Â÷Ãø 100V, 15A·Î »ç¿ë°¡´ÉÇÏ°í, Ãâ·ÂÀº 200W â©ïÜ(¼öÁ¤)Á¦¾î¹æ½ÄÀ¸·Î Sputtering ¼Óµµ´Â 20nm/min (SiO2 TARGET »ç¿ë½Ã ±âÁØ)ÀÔ´Ï´Ù. |
- TARGETÀº ¥õ80, ³Ã°¢, °¡¿ °¡´ÉÇÔ |
- °í¼ÓÀ¸·Î Áø°ø¹è±â¸¦ ½ÃÅ´ |
- µµÀÔ GAS´Â À¯·®Á¶Àý VALVE·Î ¹Ì¼¼Á¶ÀýÀ» ÇÒ ¼ö ÀÖÀ½ |
- Áø°ø°è, ¿Âµµ Áö½Ã Á¶Àý°è, ¾ÈÀüÁ¶ÀÛ¿ë ºñ»ó°æº¸±âµî ÇÊ¿äÇÑ °è±â·ù°¡ Á¶¸³ ºÎÂøµÇ¾î ÀÖ´Ù. |
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RFS-200 |
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Model |
RFS-200 |
Standard target |
¥õ80, 1~5t |
Vacuum chamber |
Vacuum chamber200(W)¡¿250(D)¡¿150(H)§®,
SUS-304 Front door |
񃒀 (Substrate electrode) |
¥õ80 Cu Heating &cooling |
Cathode (Target electrode) |
¥õ80 Cu Water cooling |
Shutter |
¥õ95§®¡¿1t Manual operation |
RF power supply |
200W, 13.56MHz |
±âÆÇ °¡¿ Àü¿ø |
Digital Auto control Max 350¡É |
¹è±â°è (Vacuum system) |
Oil diffusion pump 2¨ö",250L/min,
Oil sealed pump G-100D 120L/min |
Dimensions |
800(W)¡¿630(D)¡¿1450(H)§® |
Weight |
200Kg |
Power requirement |
1¥õ, 100V, 1.3Kw |
Power requirement for RF |
1¥õ, 100V 0.5Kw |
Cooling water requirement |
200kPa, 5L/min, 20¡ÉÀÌÇÏ |
µµ´Þ ¾Ð·Â |
6.7x10-4Pa (5.0x10-6torr) |
¹è±â ½Ã°£ |
10-3Pa (7.5x10-6torr) 5ºÐ |
Sputtering pressure |
10-1Pa Ar |
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2) ÀÌ¿Â ½ºÆÄÅ͸µ ÀåÄ¡ (Compact Ion-Sputtering System) |
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- Á¶ÀÛÀÌ °£´ÜÇÏ°í, ½Ã·áÀÇ Coating󸮰¡ ´Ü½Ã°£¿¡ °¡´É |
- Coating½Ã°£À» ¼³Á¤ÇÒ ¼ö ÀÖ½À´Ï´Ù. |
- Ultra Compact, Coating and Etching |
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VPS-020 / VPS-050 |
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Model |
VPS-020 |
VPS-050 |
Standard Target |
¥õ50mm Au 1°³ (Coating)
¥õ50mm Al 1°³ (Etching) |
¥õ100mm Au 1°³ (Coating)
¥õ100mm Al 1°³ (Etching) |
Specimen base(½Ã·á´ë) |
¥õ70mm |
¥õ100mm |
³ôÀÌ Á¶Àý¹üÀ§ : 15mm, 20mm, 60mm |
Chamber |
¥õ120mm x 120mm(D) |
¥õ240mm x 240mm(D) |
Rotary Vacuum Pump |
G-20DA (20L/min) |
G-100D (100L/min) |
High voltage power supply |
lkV, 0~20mA (Àü·ù°è ºÎÂø, ¾ÈÀüȸ·Î ³»Àå) |
Coating Method |
AC/DC Sputtering |
Etching Method |
AC/DC Sputtering |
Timer |
0 ~ 15ºÐ ¿¬¼Ó °¡º¯ |
Gas regulating mechanism |
Needle valve |
Power |
1¥õ, 100V, 0.4Kw |
1¥õ, 100V, 0.5Kw |
Dimension(WxDxH) |
160 x 365 x 317mm |
282 x 485 x440mm |
Weight |
8.5kg |
20kg |
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