Á÷°áÇü Oil Áø°øÆßÇÁ(G, GLD, GCD series) Diaphram Dry Vacuum Pump(DA series, DTC series)

 

Á÷°áÇü Oil Áø°øÆßÇÁ(G, GLD, GCD series)  

Diaphram Dry Vacuum Pump(DA series, DTC series) 

Potable Aspirator (MDA-015, MDA-050, MDA-020C)

 Accessories(Oil mist Trap, Vacuum Oil)

Áø°øÁõÂøÀåÄ¡(Vacuum Coater)

 ½ºÆÄÅ͸µ ÀåÄ¡(Sputtering System)

 Áø°ø¹è±âÀåÄ¡(High Vacuum Pumping System, Diffusion pump & Turbo punp system)

 ½ºÄÚ·Ñ °Ç½Ä Áø°øÆßÇÁ(Scroll Dry Vacuum Pump)

 Áø°ø°ÔÀÌÁö (Vacuum Gauge)

 Çï·ý ¸®Å© µðÅØÅÍ (Helium Leak Detector)

 

 

½ºÆÄÅ͸µ ÀåÄ¡(Sputtering System)
 

- Áø°øÁõÂøº¸´Ùµµ Á¤¹ÐÇÏ°í °íÁ¤µµÇÑ ¹Ú¸·À» ÀçÇö¼º ÁÁ°Ô Çü¼ºÇÏ°í, Áø°øÁõÂøÀ¸·Î´Â ºÒ°¡´ÉÇÑ °íÀ¶Á¡ ¹°ÁúÀÇ ¼º¸·µµ °¡´ÉÇÑ   puttering ÀåÄ¡ÀÔ´Ï´Ù.

  - ¿ëµµ¿¡ µû¶ó °íÁÖÆÄ Magnetron Sputter, °íÁÖÆÄ Sputter, ÀÌ¿Â Sputterµî ¼±ÅÃÇÒ ¼ö ÀÖ½À´Ï´Ù.
  1) °íÁÖÆÄ ½ºÆÄÅ͸µ ÀåÄ¡(Compact radio frequency Sputtering System)

- CompactÇÑ ¼³°è
- Àü¿øÀº 1Â÷Ãø 100V, 15A·Î »ç¿ë°¡´ÉÇÏ°í, Ãâ·ÂÀº 200W â©ïÜ(¼öÁ¤)Á¦¾î¹æ½ÄÀ¸·Î   Sputtering ¼Óµµ´Â 20nm/min (SiO2 TARGET »ç¿ë½Ã ±âÁØ)ÀÔ´Ï´Ù.
- TARGETÀº ¥õ80, ³Ã°¢, °¡¿­ °¡´ÉÇÔ
- °í¼ÓÀ¸·Î Áø°ø¹è±â¸¦ ½ÃÅ´
- µµÀÔ GAS´Â À¯·®Á¶Àý VALVE·Î ¹Ì¼¼Á¶ÀýÀ» ÇÒ ¼ö ÀÖÀ½
- Áø°ø°è, ¿Âµµ Áö½Ã Á¶Àý°è, ¾ÈÀüÁ¶ÀÛ¿ë ºñ»ó°æº¸±âµî ÇÊ¿äÇÑ °è±â·ù°¡ Á¶¸³ ºÎÂøµÇ¾î   ÀÖ´Ù.

RFS-200

 

Model

RFS-200

Standard target

    ¥õ80, 1~5t

   Vacuum chamber

    Vacuum chamber200(W)¡¿250(D)¡¿150(H)§®, SUS-304 Front door

񃒀 (Substrate electrode)

    ¥õ80 Cu Heating &cooling

Cathode (Target electrode)

    ¥õ80 Cu Water cooling

Shutter

    ¥õ95§®¡¿1t Manual operation

RF power supply

    200W, 13.56MHz

±âÆÇ °¡¿­ Àü¿ø

    Digital Auto control Max 350¡É

¹è±â°è (Vacuum system)

    Oil diffusion pump 2¨ö",250L/min, Oil sealed pump G-100D 120L/min

Dimensions

    800(W)¡¿630(D)¡¿1450(H)§®

Weight

    200Kg

Power requirement

    1¥õ, 100V, 1.3Kw

Power requirement for RF

    1¥õ, 100V 0.5Kw

Cooling water requirement

    200kPa, 5L/min, 20¡ÉÀÌÇÏ

µµ´Þ ¾Ð·Â

    6.7x10-4Pa (5.0x10-6torr)

¹è±â ½Ã°£

    10-3Pa (7.5x10-6torr) 5ºÐ

Sputtering pressure

    10-1Pa Ar

  2) ÀÌ¿Â ½ºÆÄÅ͸µ ÀåÄ¡ (Compact Ion-Sputtering System)

- Á¶ÀÛÀÌ °£´ÜÇÏ°í, ½Ã·áÀÇ Coating󸮰¡ ´Ü½Ã°£¿¡ °¡´É
- Coating½Ã°£À» ¼³Á¤ÇÒ ¼ö ÀÖ½À´Ï´Ù.
- Ultra Compact, Coating and Etching

VPS-020 / VPS-050

 

Model

VPS-020

VPS-050

Standard Target

¥õ50mm Au 1°³ (Coating)
¥õ50mm Al 1°³ (Etching)

¥õ100mm Au 1°³ (Coating)
¥õ100mm Al 1°³ (Etching)

Specimen base(½Ã·á´ë)

¥õ70mm

¥õ100mm

³ôÀÌ Á¶Àý¹üÀ§ : 15mm, 20mm, 60mm

Chamber

¥õ120mm x 120mm(D)

¥õ240mm x 240mm(D)

Rotary Vacuum Pump

G-20DA (20L/min)

G-100D (100L/min)

High voltage power supply

lkV, 0~20mA (Àü·ù°è ºÎÂø, ¾ÈÀüȸ·Î ³»Àå)

Coating Method

AC/DC Sputtering

Etching Method

AC/DC Sputtering

Timer

0 ~ 15ºÐ ¿¬¼Ó °¡º¯

Gas regulating mechanism

Needle valve

Power

1¥õ, 100V, 0.4Kw

1¥õ, 100V, 0.5Kw

Dimension(WxDxH)

160 x 365 x 317mm

282 x 485 x440mm

Weight

8.5kg

20kg